Title :
Novel RF MEMS mechanically tunable dielectric phase shifter
Author :
Somjit, N. ; Stemme, G. ; Oberhammer, J.
Author_Institution :
R. Inst. of Technol., Stockholm
Abstract :
This paper presents three variations of novel single-stage digital passive RF MEMS phase shifters. Relative phase shift is achieved by moving a micromachined lambda/2-long dielectric block by a MEMS actuator above a 3 dimensional micromachined coplanar waveguide. The relative phase-shift of a single stage is determined by an artificially tailor-made dielectric constant of the block which is designed by a periodically etched pattern. The devices are fabricated and assembled by wafer-scale processes using bulk and surface micromachining. The measurement results show that already the first prototypes of the phase-shifter designs at the nominal frequency of 77 GHz have both in the up and in the down state a return loss better than -25 dB for 45degand 30deg phase shifter and better than -12 dB for 15deg phase-shifter with an insertion loss better than -0.9 dB at 5 GHz bandwidth. The phase shifters also perform well from 10-100 GHz with the return loss better than -10 dB, an insertion loss of less than -1.5 dB and a fairly linear phase-shift for the whole frequency range.
Keywords :
coplanar waveguides; dielectric devices; microactuators; micromachining; microwave phase shifters; permittivity; 3D micromachined coplanar waveguide; actuator; dielectric constant; frequency 10 GHz to 100 GHz; frequency 5 GHz; mechanically tunable dielectric phase shifter; micromachined dielectric block; periodically etched pattern; single-stage digital passive RF MEMS phase shifters; surface micromachining; wafer-scale processes; Actuators; Assembly; Coplanar waveguides; Dielectric constant; Etching; Frequency; Insertion loss; Micromechanical devices; Phase shifters; Radiofrequency microelectromechanical systems;
Conference_Titel :
Infrared, Millimeter and Terahertz Waves, 2008. IRMMW-THz 2008. 33rd International Conference on
Conference_Location :
Pasadena, CA
Print_ISBN :
978-1-4244-2119-0
Electronic_ISBN :
978-1-4244-2120-6
DOI :
10.1109/ICIMW.2008.4665749