• DocumentCode
    3279044
  • Title

    Development of core-less substrate for multi wiring layers

  • Author

    Maehara, M. ; Kato, I. ; Akimoto, S. ; Okuma, T. ; Iino, R. ; Tsukamoto, T.

  • Author_Institution
    Semicond. Res. Lab., Toppan Printing Co. Ltd., Saitama, Japan
  • fYear
    2002
  • fDate
    10-12 Dec. 2002
  • Firstpage
    280
  • Lastpage
    284
  • Abstract
    A chip size package (CSP) and fine pitch ball grid array (FBGA) are increasing by becoming the focal point of attention in semiconductor field. A reel-to-reel consecutive manufacturing process has been developed by the authors for a tape-based substrate consisting of multi conductive wiring layers (minimum four layers) with ball grid array connections. This substrate, compared to those presently in use, is (a) thin (150∼200um for four layers) and low weight; (b) applicable to many pin counts; (c) makes possible fine conductive wiring and insulating layers with high accuracy in layer thickness and (d) facilitates the control of characteristic impedance. Interlayer connection technology is key to multi-conductive wiring layer structures, which may have effect primarily on substrate reliability. In the present study, a copper deposited plating process was used in conjunction with UV-laser drilling so as to produce very small via-holes in diameter 40-50um as interlayer connections. The reliability of interconnections was confirmed for via-holes with diameter 40-50um under the condition of 1000cycle thermal shocks of -65C/+150C a gaseous phase. Filled via-hole formation without interior voids was found to take place in the plating process. Minute stacked via-hole formation was noted to provide a substrate with high density pin counts. The substrate structure was designed with consideration electromagnetic transmission characteristics by computer simulation. The present substrate meets recent requirements for GHz order signal transmission.
  • Keywords
    ball grid arrays; chip scale packaging; copper; electroplated coatings; fine-pitch technology; integrated circuit interconnections; integrated circuit reliability; laser beam machining; substrates; -65 to 150 degC; 40 to 50 micron; Cu; UV laser drilling; characteristic impedance; chip size package; computer simulation; copper plating process; core-less substrate; electromagnetic transmission; fine pitch ball grid array; interlayer connection technology; multi-conductive wiring layer; reel-to-reel consecutive manufacturing process; reliability; semiconductor packaging; tape-based substrate; thermal cycling; via hole formation; Chip scale packaging; Copper; Electronics packaging; Impedance; Insulation; Manufacturing processes; Semiconductor device packaging; Substrates; Thickness control; Wiring;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Packaging Technology Conference, 2002. 4th
  • Print_ISBN
    0-7803-7435-5
  • Type

    conf

  • DOI
    10.1109/EPTC.2002.1185683
  • Filename
    1185683