• DocumentCode
    3279826
  • Title

    Broadband complex permittivity measurements of microwave interconnects and bonding materials

  • Author

    Rahman, Nahid ; Korolev, Konstantin A. ; Afsar, Mohammed N. ; Cheung, Rudy ; Aghion, Maurice

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Tufts Univ., Medford, MA
  • fYear
    2008
  • fDate
    15-19 Sept. 2008
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    This paper presents a systematic study of the complex dielectric permittivity of two interconnect and bonding materials that are used in high frequency multi-chip modules. The materials are characterized in the Q-band, V-band and W-band frequency ranges using a broadband quasi-optical millimeter wave spectrometer with a backward wave oscillator (BWO) as a non-destructive high-power tunable source of coherent radiation. The real and imaginary parts of the dielectric permittivity and loss tangent have been accurately calculated from the transmittance spectra.
  • Keywords
    MMIC; backward wave oscillators; dielectric loss measurement; integrated circuit interconnections; microwave circuits; permittivity; permittivity measurement; submillimetre wave integrated circuits; submillimetre wave spectroscopy; BWO; MMIC; Q-band frequency; V-band frequency; W-band frequency; backward wave oscillator; bonding materials; broadband complex permittivity measurements; broadband quasi-optical millimeter wave spectrometer; coherent radiation; dielectric loss tangent; high frequency multichip modules; microwave interconnects; nondestructive high-power tunable source; transmittance spectra; Absorption; Bonding; Dielectric losses; Dielectric materials; Electrochemical impedance spectroscopy; Frequency; Integrated circuit interconnections; Optical materials; Permittivity measurement; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Infrared, Millimeter and Terahertz Waves, 2008. IRMMW-THz 2008. 33rd International Conference on
  • Conference_Location
    Pasadena, CA
  • Print_ISBN
    978-1-4244-2119-0
  • Electronic_ISBN
    978-1-4244-2120-6
  • Type

    conf

  • DOI
    10.1109/ICIMW.2008.4665789
  • Filename
    4665789