Title :
Quasi-optical notch filters for plasma imaging applications
Author :
Liang, Tianran ; Domier, Calvin W. ; Shen, Zuowei ; Luhmann, Neville C., Jr.
Author_Institution :
Univ. of California at Davis, Davis, CA
Abstract :
Quasi-optical notch filters are employed to protect plasma imaging arrays from stray radiation from high power electron cyclotron resonance heating (ECRH) sources. A new imaging arrangement permits stacking of multiple filters to maximize ECRH rejection. Simulations indicate that a stack of three filters can provide a notch depth of >60 dB at 140 GHz, and retain this high rejection over an incident angle range of plusmn8deg.
Keywords :
microwave imaging; notch filters; optical filters; plasma diagnostics; plasma radiofrequency heating; ECRH rejection; high power electron cyclotron resonance heating sources; multiple filters stacking; notch depth; plasma imaging arrays; quasi-optical notch filters; stray radiation; Cyclotrons; Electrons; Filters; Heating; Plasma applications; Plasma simulation; Plasma sources; Protection; Resonance; Stacking;
Conference_Titel :
Infrared, Millimeter and Terahertz Waves, 2008. IRMMW-THz 2008. 33rd International Conference on
Conference_Location :
Pasadena, CA
Print_ISBN :
978-1-4244-2119-0
Electronic_ISBN :
978-1-4244-2120-6
DOI :
10.1109/ICIMW.2008.4665804
