• DocumentCode
    3280189
  • Title

    Experimental analysis of mechanical stresses and material properties in multi-layer interconnect systems by fibDAC

  • Author

    Vogel, D. ; Auerswald, E. ; Michel, Bruno ; Rzepka, S.

  • Author_Institution
    Micro Mater. Center Technol., Fraunhofer ENAS, Chemnitz, Germany
  • fYear
    2013
  • fDate
    13-15 June 2013
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    The paper presents a new stress measurement method on base of stress relief caused by local material removal with ion milling in FIB equipment. Stress relief deformations extracted from SEM micrographs by means of digital image correlation allow the determination of stresses, as well as to estimate Young´s modulus on the position of ion milling. The paper gives an introduction into the method. The feasibility to extract local stresses in multilayer stacks, both in lateral direction and in depth, is discussed in more detail.
  • Keywords
    Young´s modulus; deformation; focused ion beam technology; milling; multilayers; scanning electron microscopy; stress measurement; FIB equipment; SEM micrographs; Stress relief deformations; Young´s modulus; digital image correlation; fibDAC stress relief; ion milling; local material removal; material properties; mechanical stresses; multilayer interconnect systems; stress measurement; Films; Milling; Semiconductor device measurement; Silicon; Stress; Stress measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Interconnect Technology Conference (IITC), 2013 IEEE International
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-1-4799-0438-9
  • Type

    conf

  • DOI
    10.1109/IITC.2013.6615557
  • Filename
    6615557