DocumentCode :
3280336
Title :
Macroscopic and microscopic interface adhesion strength of copper damascene interconnects
Author :
Shishido, N. ; Kamiya, Shinichiro ; Chen, Ci ; Sato, Hikaru ; Koiwa, K. ; Omiya, Manabu ; Nishida, Masanori ; Suzuki, Takumi ; Nakamura, T. ; Nokuo, T.
Author_Institution :
Nagoya Inst. of Technol., Nagoya, Japan
fYear :
2013
fDate :
13-15 June 2013
Firstpage :
1
Lastpage :
3
Abstract :
Macroscopic and microscopic adhesion strength of damascene interconnects was investigated by evaluating local strength through delaminating different scales of adhesion area under SEM observation. Macroscopic strength obtained by the areas larger than the copper grain was almost constant after considering the macroscopic plastic deformation. However, microscopic strength obtained by the areas smaller than the copper grain spread around the macroscopic strength and was highly sensitive to the copper grain structure, especially the grain boundary.
Keywords :
adhesion; copper; delamination; grain boundaries; integrated circuit interconnections; scanning electron microscopy; silicon compounds; Cu-SiN; SEM; copper damascene interconnects; copper grain structure; delamination; grain boundary; macroscopic interface adhesion strength; microscopic interface adhesion strength; Adhesives; Copper; Energy dissipation; Microscopy; Plastics; Silicon compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Interconnect Technology Conference (IITC), 2013 IEEE International
Conference_Location :
Kyoto
Print_ISBN :
978-1-4799-0438-9
Type :
conf
DOI :
10.1109/IITC.2013.6615564
Filename :
6615564
Link To Document :
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