• DocumentCode
    3280454
  • Title

    Analysis of squeeze-film air damping of thick perforated plate in MEMS device

  • Author

    Zhou, Zelong ; Wang, Xiong

  • Author_Institution
    Sch. of Mechatron. Eng. & Autom., Nat. Univ. of Defense Technol., Changsha, China
  • fYear
    2011
  • fDate
    20-23 Feb. 2011
  • Firstpage
    131
  • Lastpage
    133
  • Abstract
    Moving plates in silicon microstructures are sometimes perforated to reduce the air damping for many applications. Most of the perforated plates are manufactured by anisotropic wet etching and DRIE. In fact, the cross-sections of these holes are not uniform, and the areas are variational. When the plates move against the substrate, squeeze-film air damping will badly affect the dynamic characteristics of the vibratory structure. Generally, the damping of air flow is determined by the Reynolds equation. However, the Reynolds equation is not used for the thick perforate plate, especially for the holes with variational cross-section. In this paper, the lava pipe model for air flow in the variational cross-section holes is used to obtain the velocity of air flow. Use the velocity of air flow to modify the conventional Reynolds equation, to obtain the pressure of the holes with variational cross-section. The pressure between the two ends of the hole can be obtained by the use of the modified Reynolds equation. It is valuable for design of MEMS device with thick perforated plate.
  • Keywords
    elemental semiconductors; etching; micromechanical devices; silicon; DRIE; MEMS device; Si; air flow damping; anisotropic wet etching; lava pipe model; microstructures; modified Reynolds equation; squeeze-film air damping; thick perforate plate; thick perforated plate; variational cross-section holes; vibratory structure; Damping; Educational institutions; Equations; Mathematical model; Micromechanical devices; Sensors; Substrates; MEMS; Reynolds equation; Squeeze-film air damping;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
  • Conference_Location
    Kaohsiung
  • Print_ISBN
    978-1-61284-775-7
  • Type

    conf

  • DOI
    10.1109/NEMS.2011.6017312
  • Filename
    6017312