Title :
Intercalated multi-layer graphene grown by CVD for LSI interconnects
Author :
Kondo, Daishi ; Nakano, Hisamatsu ; Bo Zhou ; Kubota, Ichiro ; Hayashi, K. ; Yagi, Keita ; Takahashi, Masaharu ; Sato, Mitsuhisa ; Sato, Seiki ; Yokoyama, Naoki
Author_Institution :
Collaborative Res. Team Green Nanoelectron. Center (GNC), AIST, Tsukuba, Japan
Abstract :
We have fabricated multi-layer graphene (MLG) wiring and demonstrated a resistivity of the same order as Cu and reliability better than Cu. The MLG was synthesized epitaxially by chemical vapor deposition (CVD) on an epitaxial Co film, resulting in quality and electrical properties as good as those of a graphite crystal. The MLG was further intercalated with FeCl3 to achieve a resistivity as low as 9.1 μΩ cm. Our results show that intercalated MLG is really promising for future LSI interconnects.
Keywords :
chemical vapour deposition; electrical resistivity; graphene; integrated circuit interconnections; integrated circuit reliability; large scale integration; C-Co; CVD; Co; LSI interconnects; chemical vapor deposition; epitaxial Co film; intercalated multilayer graphene; reliability; resistivity; Conductivity; Films; Graphene; Scanning electron microscopy; Substrates; Wiring;
Conference_Titel :
Interconnect Technology Conference (IITC), 2013 IEEE International
Conference_Location :
Kyoto
Print_ISBN :
978-1-4799-0438-9
DOI :
10.1109/IITC.2013.6615600
