DocumentCode :
3281060
Title :
Fabrication and characterization of 100-nm wide silicon nanocantilevers using top-down approach
Author :
Guillon, Samuel ; Saya, Daisuke ; Mazenq, Laurent ; Nicu, Liviu ; Perisanu, Sorin ; Vincent, Pascal
Author_Institution :
LAAS-CNRS, Univ. of Toulouse, Toulouse, France
fYear :
2011
fDate :
20-23 Feb. 2011
Firstpage :
258
Lastpage :
261
Abstract :
We present fabrication and characterization of silicon nanocantilevers as nano electromechanical systems (NEMS). We fabricated silicon nanocantilever using silicon on insulator (SOI) wafer by employing stepper UV lithography, which permits resolution of 100 nm. The nanocantilevers were driven by electrostatic force with approaching tungsten tip inside a scanning electron microscope (SEM). Both lateral and vertical resonance frequencies were visually detected with the SEM and compared with analytical results.
Keywords :
cantilevers; nanoelectromechanical devices; nanofabrication; scanning electron microscopy; silicon-on-insulator; ultraviolet lithography; NEMS; SEM; SOI wafer; Si; electrostatic force; lateral resonance frequency; nanoelectromechanical system; scanning electron microscope; silicon on insulator wafer; size 100 nm; stepper UV lithography; top-down approach; tungsten tip; vertical resonance frequency; wide silicon nanocantilever fabrication; Clamps; Frequency measurement; Lithography; Nanoelectromechanical systems; Resonant frequency; Scanning electron microscopy; Silicon; NEMS; UV stepper photo repeater; nanomechanical resonator; silicon nanocantilever;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-61284-775-7
Type :
conf
DOI :
10.1109/NEMS.2011.6017343
Filename :
6017343
Link To Document :
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