DocumentCode :
3281279
Title :
Study on N type 4H-SiC minority carrier lifetime by microwave photoconductivity decay technology
Author :
Qirong, Lu ; Dong-mei, Gao ; Yan-bing, Wei ; Bin, Huang
Author_Institution :
Center of Modern Educ. Technol., Guilin Univ. of Technol., Guilin, China
fYear :
2011
fDate :
15-17 April 2011
Firstpage :
1734
Lastpage :
1737
Abstract :
Microwave photoconductivity decay technology is used to measure the minority carrier lifetime of N type 4H SiC.Respectively setting the excitation intensity to 100%, 50%, 25% and 5% the minority carrier lifetime is measured. The results indicated that the minority carrier lifetime of N type 4H SiC sample is about 0.138μs and the incident laser intensity is not the main factor to increase or decrease the lifetime. But when the incident laser intensity is weakening, the signal wave amplitude is lessened and the noise is correspondingly increased. This means some weak signal measurement technology such as filter or smooth window must be used. The experiment indicated that Microwave photoconductivity decay technology is convenient and efficient to measure the N type carrier lifetime which have a great significance to 4H-SiC.
Keywords :
carrier lifetime; photoconductivity; silicon compounds; wide band gap semiconductors; N type 4H-SiC; SiC; incident laser intensity; microwave photoconductivity decay technology; minority carrier lifetime; signal measurement technology; Charge carrier lifetime; Masers; Microwave filters; Microwave measurements; Photoconductivity; Semiconductor device measurement; 4H-SiC; intensity; microwave photoconductivity; minority carrier lifetime;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electric Information and Control Engineering (ICEICE), 2011 International Conference on
Conference_Location :
Wuhan
Print_ISBN :
978-1-4244-8036-4
Type :
conf
DOI :
10.1109/ICEICE.2011.5777661
Filename :
5777661
Link To Document :
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