Title :
A method to reduce notching effect on the anchors of a micro-gyroscope
Author :
Hong, Peizhen ; Guo, Zhongyang ; Yang, Zhenchuan ; Yan, Guizhen
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Abstract :
A novel three-step DRIE recipe with pulsed low frequency platen power of 380 KHz is proposed in this paper. The depassivation time/duty cycle and the etching time/duty cycle of the pulsed low frequency platen power in the etching step of Bosh process are experimentally studied through the silicon on glass process (SOG) of a micro-gyroscope. Experiments show that the recipe with a passivation time of 2s, a depassivation time/duty cycle of 2s/75% and a etching time/duty cycle of 4s/85% can effectively reduce the notching effect on the anchors of the gyroscope while keep good sidewall verticality and present no grass.
Keywords :
anchors; gyroscopes; microfabrication; microsensors; sputter etching; SOG; Si; anchors; depassivation time-duty cycle; etching time/duty cycle; frequency 380 kHz; microgyroscope; notching effect reduction method; pulsed low frequency platen power; three-step DRIE recipe; time 2 s; Etching; Fabrication; Glass; Gyroscopes; Ions; Passivation; Silicon; LF platen power; gyroscope; notching effect; pulse bias; three step DRIE;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-61284-775-7
DOI :
10.1109/NEMS.2011.6017362