• DocumentCode
    3281530
  • Title

    The deflection length and emitter width on sensitivity of magnetotransistor

  • Author

    Phetchakul, Toempong ; Sottip, Panyakorn ; Leepattarapongpan, Chana ; Penpondee, Narichapan ; Pengpad, Putapon ; Srihapat, Arckom ; Hruanun, Chandet ; Poyai, Amporn

  • Author_Institution
    Dept. of Electron., King Mongkut´´s Inst. of Technol. Ladkrabang, Bangkok, Thailand
  • fYear
    2011
  • fDate
    20-23 Feb. 2011
  • Firstpage
    359
  • Lastpage
    362
  • Abstract
    This paper presents a study of effect of deflection length and emitter width on sensitivity of magnetotransistor. The device has been fabrication on standard CMOS technology. It can detect magnetic field applied vertically to the chip. The structure consists of emitter (n-type), base (p-type) and collector (n-type) on silicon p-substrate. The device can sense magnetic field by Hall Effect theory and carrier deflection resulting to difference between base and collector current (ΔICB) related to magnetic field (BZ) strength. From the experiment is comparing emitter width of 4, 5 and 10 micrometer at deflection length of 10 and 20 micrometer. The result shows that increase in injection emitter width cause to the sensitivity decreases and the deflection length of 20 micrometer is the best sensitivity. These results are very useful for developing the magnetotransistor for high sensitivity and performance.
  • Keywords
    CMOS integrated circuits; magnetic field effects; magnetoelectronics; sensitivity; transistors; BZ strength; Hall effect theory; base current; carrier deflection; collector current; deflection length; emitter width; injection emitter; magnetic field strength; magnetotransistor; n-type; p-type; sensitivity; silicon p-substrate; standard CMOS technology; Hall effect; Lorentz covariance; Magnetic circuits; Magnetic devices; Magnetic fields; Magnetic tunneling; Sensitivity; Hall effect; Magnetotransistor;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
  • Conference_Location
    Kaohsiung
  • Print_ISBN
    978-1-61284-775-7
  • Type

    conf

  • DOI
    10.1109/NEMS.2011.6017367
  • Filename
    6017367