DocumentCode :
3281530
Title :
The deflection length and emitter width on sensitivity of magnetotransistor
Author :
Phetchakul, Toempong ; Sottip, Panyakorn ; Leepattarapongpan, Chana ; Penpondee, Narichapan ; Pengpad, Putapon ; Srihapat, Arckom ; Hruanun, Chandet ; Poyai, Amporn
Author_Institution :
Dept. of Electron., King Mongkut´´s Inst. of Technol. Ladkrabang, Bangkok, Thailand
fYear :
2011
fDate :
20-23 Feb. 2011
Firstpage :
359
Lastpage :
362
Abstract :
This paper presents a study of effect of deflection length and emitter width on sensitivity of magnetotransistor. The device has been fabrication on standard CMOS technology. It can detect magnetic field applied vertically to the chip. The structure consists of emitter (n-type), base (p-type) and collector (n-type) on silicon p-substrate. The device can sense magnetic field by Hall Effect theory and carrier deflection resulting to difference between base and collector current (ΔICB) related to magnetic field (BZ) strength. From the experiment is comparing emitter width of 4, 5 and 10 micrometer at deflection length of 10 and 20 micrometer. The result shows that increase in injection emitter width cause to the sensitivity decreases and the deflection length of 20 micrometer is the best sensitivity. These results are very useful for developing the magnetotransistor for high sensitivity and performance.
Keywords :
CMOS integrated circuits; magnetic field effects; magnetoelectronics; sensitivity; transistors; BZ strength; Hall effect theory; base current; carrier deflection; collector current; deflection length; emitter width; injection emitter; magnetic field strength; magnetotransistor; n-type; p-type; sensitivity; silicon p-substrate; standard CMOS technology; Hall effect; Lorentz covariance; Magnetic circuits; Magnetic devices; Magnetic fields; Magnetic tunneling; Sensitivity; Hall effect; Magnetotransistor;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-61284-775-7
Type :
conf
DOI :
10.1109/NEMS.2011.6017367
Filename :
6017367
Link To Document :
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