DocumentCode :
3283117
Title :
Fabrication of two-point-supported annular-type microresonators with capacitive transducer gaps
Author :
Murakami, Sunao ; Konno, Mitsuo ; Ikehara, Tsuyoshi ; Maeda, Ryutaro ; Mihara, Takashi
Author_Institution :
Res. Center for Ubiquitous MEMS & Micro Eng. (UMEMSME), Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
fYear :
2011
fDate :
20-23 Feb. 2011
Firstpage :
707
Lastpage :
710
Abstract :
Disk microresonators employing in-plane resonant modes are promising candidates as functional elements for high-sensitive mass sensing applications because they provide a high quality factor (Q) in air at atmospheric pressure. The authors have newly designed and fabricated single crystal silicon (SCS) annular micromechanical resonators with an inner to outer radius ratio of 0.17. The beam structures to support the resonator were connected to the two nodal points expected for a specified in-plane resonant mode. The resonator was electrostatically driven and detected with 150-nm-wide vertical transducer gaps that were fabricated by trench etching of the SCS using deep reactive ion etching (D-RIE) with a resist mask patterned by electron beam lithography. The fabricated resonators show a resonant peak at 50.10 MHz with a Q of 3000 in air. The measured peak resonant frequency agreed well with the frequency predicted by finite element simulations.
Keywords :
Q-factor; capacitive sensors; electron resists; elemental semiconductors; finite element analysis; microcavities; micromechanical resonators; silicon; sputter etching; Q-factor; air pressure; atmospheric pressure; capacitive transducer gaps; deep reactive ion etching; disk microresonators; electron beam lithography; finite element simulations; frequency 50.10 MHz; high quality factor; high-sensitive mass sensing applications; in-plane resonant modes; resist mask; single crystal silicon annular micromechanical resonators; size 150 nm; trench etching; two-point-supported annular-type microresonator fabrication; vertical transducer gaps; Finite element methods; Optical resonators; Resonant frequency; Shape; Silicon; Transducers; Vibrations; annular resonator; in-plane resonant mode; nodal point; resonant frequency; transducer gap;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-61284-775-7
Type :
conf
DOI :
10.1109/NEMS.2011.6017452
Filename :
6017452
Link To Document :
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