The Electrical Characteristics of Thin Gadolinium Oxide Films on Silicon Substrate by DC Reactive RF-sputtering

Author

Pan, Tung-Ming ; Lai, Chao-Sung ; Hsu, Hui-Hsin ; Wang, Jer-Chyi ; Wang, Kuan-Di ; Chen, Chun-Lin ; Lin, Jian-Chi ; Lee, Jian-Der

fYear

2005

fDate

Dec. 7-9, 2005

Firstpage

132

Lastpage

133

Keywords

Annealing; Capacitance; Electric variables; Frequency; Hafnium oxide; Leakage current; MOS capacitors; Semiconductor films; Silicon; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Device Research Symposium, 2005 International

Print_ISBN

1-4244-0083-X

Type

DOI

10.1109/ISDRS.2005.1596015

Filename

1596015

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