DocumentCode
3283516
Title
Low Sidewall Damage Plasma Etching with ICP-RIE and HBr Chemistry of Si/SiGe Resonant Interband Tunnel Diodes
Author
Park, Si-Young ; Chung, Sung-Yong ; Yu, Ronghua ; Berger, Paul R. ; Thompson, Phillip E.
fYear
2005
fDate
Dec. 7-9, 2005
Firstpage
151
Lastpage
152
Keywords
Diodes; Etching; Germanium silicon alloys; Plasma applications; Plasma chemistry; Plasma density; Plasma devices; Plasma temperature; Resonance; Silicon germanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2005 International
Print_ISBN
1-4244-0083-X
Type
conf
DOI
10.1109/ISDRS.2005.1596026
Filename
1596026
Link To Document