Title :
Low Sidewall Damage Plasma Etching with ICP-RIE and HBr Chemistry of Si/SiGe Resonant Interband Tunnel Diodes
Author :
Park, Si-Young ; Chung, Sung-Yong ; Yu, Ronghua ; Berger, Paul R. ; Thompson, Phillip E.
Keywords :
Diodes; Etching; Germanium silicon alloys; Plasma applications; Plasma chemistry; Plasma density; Plasma devices; Plasma temperature; Resonance; Silicon germanium;
Conference_Titel :
Semiconductor Device Research Symposium, 2005 International
Print_ISBN :
1-4244-0083-X
DOI :
10.1109/ISDRS.2005.1596026
