Fabrication of micro/nanometer-channel by Near-Field ElectroSpinning

Direct-written polymer micro/nanofiber from Near-Field ElectroSpinning (NFES) was utilized as shadow-mask to fabricate uniform micro/nanometer-channel. Both Single straight microfiber (line-width 2~10μm) and nanofiber (diameter 200~800nm) were direct-written on the substrate with the NFES setup, and then 2-nm-thick titanium adhesive layer and 10-nm-thick gold layer were sputtered on the substrate successively. By the ultrasonication process in acetone and de-ionized water, the polymer fiber was removed and micro/nanometer-channel with gap width ranging from 7μm to 700nm was formed. The fabrication process and related technical issues were also outlined in this work. The experimental results revealed that the micro/nanometer channel had a good uniformity, above 90% of the gap length value lied within the deviation range of ±3%. This simple and facile method can be used to define the uniform micro/nano channel for organic thin film transistors.