• DocumentCode
    3284115
  • Title

    Smart-Cut piezoresistive strain sensors for high temperature applications

  • Author

    Kuo, Hung-I ; Ko, Wen H.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Case Western Reserve Univ., Cleveland, OH, USA
  • fYear
    2009
  • fDate
    25-28 Oct. 2009
  • Firstpage
    1290
  • Lastpage
    1292
  • Abstract
    This paper presents research results on novel high performance silicon piezoresistive strain sensors based on Smart-CutTM SOI wafer, with 340 nm silicon overlayer and 1 μm buried oxide. Experimental results show that the 3 kΩ Wheatstone bridged piezoresistive strain sensor has a sensitivity of 0.14 mV/με at 5V bias and a linearity of 0.9% full scale, in the range of ±1000 /με. When tested at elevated temperatures, the gauge factor of the sensor changed from 27.6 at 24 °C to 25.4 at 130 °C, equivalent to a temperature coefficient of the gauge factor of -0.02 /°C, which is an order of magnitude smaller than the -0.55 /°C value of previous sensors developed with 2??1018 cm-3 doping. This piezoresistive sensor is suitable for applications that need high temperature stability.
  • Keywords
    high-temperature techniques; piezoresistive devices; silicon-on-insulator; strain sensors; Smart-Cut SOI wafer; Smart-Cut piezoresistive strain sensors; Wheatstone bridged piezoresistive strain sensor; high temperature applications; high temperature stability; silicon piezoresistive strain sensors; size 340 nm; temperature 130 °C; temperature 24 °C; temperature coefficient; Biomembranes; Bovine; Cells (biology); Current measurement; Impedance measurement; Leak detection; Leakage current; Microsensors; Molecular biophysics; Proteins;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Sensors, 2009 IEEE
  • Conference_Location
    Christchurch
  • ISSN
    1930-0395
  • Print_ISBN
    978-1-4244-4548-6
  • Electronic_ISBN
    1930-0395
  • Type

    conf

  • DOI
    10.1109/ICSENS.2009.5398392
  • Filename
    5398392