• DocumentCode
    3284464
  • Title

    Fluorinated ALD Al2O3 Gate Dielectrics by CF4 Plasma

  • Author

    Lai, Chao Sung ; Fan, Kung Ming ; Chen, Yi Jung ; Su, Kuo Hui ; Wu, Chang Rong ; Lin, Shian Jyh ; Lee, Chung-Yuan

  • fYear
    2005
  • fDate
    Dec. 7-9, 2005
  • Firstpage
    266
  • Lastpage
    267
  • Keywords
    CMOS technology; Chaos; Dielectric films; Dielectric substrates; Electric breakdown; Electric variables; Hysteresis; Plasma measurements; Plasma properties; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2005 International
  • Print_ISBN
    1-4244-0083-X
  • Type

    conf

  • DOI
    10.1109/ISDRS.2005.1596087
  • Filename
    1596087
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3284464