DocumentCode :
3284500
Title :
Characteristics of RuO2 bottom electrode for MIM capacitor
Author :
Do, Seung Woo ; Jang, Cheol Yeong ; Lee, Dae Gab ; Choi, Sung Hwan ; Lee, Yong Hyun
fYear :
2005
fDate :
Dec. 7-9, 2005
Firstpage :
274
Lastpage :
275
Keywords :
Annealing; Argon; Conductivity; Electrodes; MIM capacitors; Magnetic analysis; Radio frequency; Solids; Sputtering; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2005 International
Print_ISBN :
1-4244-0083-X
Type :
conf
DOI :
10.1109/ISDRS.2005.1596091
Filename :
1596091
Link To Document :
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