Characteristics of RuO₂ bottom electrode for MIM capacitor

Author

Do, Seung Woo ; Jang, Cheol Yeong ; Lee, Dae Gab ; Choi, Sung Hwan ; Lee, Yong Hyun

fYear

2005

fDate

Dec. 7-9, 2005

Firstpage

274

Lastpage

275

Keywords

Annealing; Argon; Conductivity; Electrodes; MIM capacitors; Magnetic analysis; Radio frequency; Solids; Sputtering; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Device Research Symposium, 2005 International

Print_ISBN

1-4244-0083-X

Type

DOI

10.1109/ISDRS.2005.1596091

Filename

1596091

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