The rapid fabrication process for guided-mode resonance filter

Author

Ding, Ting-Jou ; Lue, Jiann-Hwa ; Yang, Tsung-Hsun ; Lee, Chien-Chieh ; Lin, Sheng-Fu ; Chang, Jenq-Yang

Author_Institution

Dept. of Opt. & Photonics, Nat. Central Univ., Jhongli, Taiwan

fYear

2011

fDate

20-23 Feb. 2011

Firstpage

1212

Lastpage

1215

Abstract

The experimental process and results by using non-UV soft lithography method to fabricate thin-film optical guided-mode resonance (GMR) filter, are reported. The parameter stably and high through put 1-D sub-micrometer periodic optical elements are obtained by Embossing technique. The guided-mode resonance filter is taken to demonstrating. Experimental result shows the period of the fabricated filter is about 928nm and the transmittance spectrum of resonance wavelength is approximately 57%.

Keywords

embossing; optical filters; soft lithography; thin film devices; 1D submicrometer periodic optical elements; GMR filter; embossing technique; experimental process; nonUV soft lithography method; rapid fabrication process; resonance wavelength; thin-film optical guided-mode resonance filter; transmittance spectrum; Gratings; Optical device fabrication; Optical filters; Optical reflection; Optical refraction; Optical variables control; Optical waveguides; Grating; Guided-mode resonance; Soft lithography; Sol-Ge; Subwavelength;

fLanguage

English

Publisher

ieee

Conference_Titel

Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on

Conference_Location

Kaohsiung

Print_ISBN

978-1-61284-775-7

Type

conf

DOI

10.1109/NEMS.2011.6017575

Filename

6017575