DocumentCode :
3285603
Title :
Isolation Method for Bulk FinFET without Using CMP Process
Author :
Cho, Il Hwan ; Kim, Junsoo ; Park, Il Han ; Shin, Hyungcheol ; Park, Byung-Gook ; Lee, Jong Duk ; Lee, Jong-Ho
fYear :
2005
fDate :
Dec. 7-9, 2005
Firstpage :
420
Lastpage :
421
Keywords :
Anisotropic magnetoresistance; Chemical technology; Coatings; Computer science; Dry etching; FinFETs; Integrated circuit technology; Paper technology; Planarization; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2005 International
Print_ISBN :
1-4244-0083-X
Type :
conf
DOI :
10.1109/ISDRS.2005.1596165
Filename :
1596165
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3285603
