Title :
Ab-initio Calculations for Indium Diffusion in Silicon
Author :
Kwan-sun ; Hwang, Chi-Ok ; Won, Taeyoung
Keywords :
Atomic measurements; Boron; CMOS process; CMOS technology; Electronic mail; Impurities; Indium; Ion implantation; Nanoscale devices; Silicon;
Conference_Titel :
Semiconductor Device Research Symposium, 2005 International
Print_ISBN :
1-4244-0083-X
DOI :
10.1109/ISDRS.2005.1596166
