DocumentCode :
3285746
Title :
Nanocrystalline-si thin film fabricated by inductively coupled plasma chemical vapor deposition for flexible electronics
Author :
Han, Sang-Myeon ; Park, Joong-Hyun ; Lee, Hye-Jin ; Shin, Kwang-Sub ; Han, Min-Koo
fYear :
2005
fDate :
Dec. 7-9, 2005
Firstpage :
440
Lastpage :
441
Keywords :
Chemical vapor deposition; Flexible electronics; Helium; Plasma chemistry; Plasma density; Plasma devices; Plasma temperature; Semiconductor films; Sputtering; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2005 International
Print_ISBN :
1-4244-0083-X
Type :
conf
DOI :
10.1109/ISDRS.2005.1596175
Filename :
1596175
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3285746
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