Title :
A new VOx thin film for uncooled infrared focal plane arrays
Author :
Chen, Xiqu ; Lv, Qiang
Author_Institution :
Dept. of Math. & Phys., Wuhan Polytech. Univ., Wuhan, China
Abstract :
In this paper, a new VOx thin film for uncooled infrared focal plane arrays is proposed. The proposed VOx thin film is fabricated with a magnetron sputtering method and has particular optical properties for infrared wavelength. The fabricating technology of the VOx thin film has low-temperature characteristics and is completely compatible with the fabricating process of CMOS integrated circuits for uncooled infrared focal plane array. Experimentally measured results indicate that the fabricated VOx thin film is potential to be applied as optical detecting materials for medium-wavelength infrared (MWIR) and long-wavelength infrared (LWIR).
Keywords :
CMOS integrated circuits; focal planes; optical properties; sputtering; vanadium compounds; CMOS integrated circuits; VO; infrared wavelength; long-wavelength infrared; magnetron sputtering method; medium-wavelength infrared; optical detecting materials; optical properties; thin film; uncooled infrared focal plane arrays; CMOS integrated circuits; Detectors; Imaging; Laser transitions; Millimeter wave technology; Optical device fabrication; Resistance; VOx; infrared; magnetron sputtering;
Conference_Titel :
Electric Information and Control Engineering (ICEICE), 2011 International Conference on
Conference_Location :
Wuhan
Print_ISBN :
978-1-4244-8036-4
DOI :
10.1109/ICEICE.2011.5777914
