DocumentCode :
3287165
Title :
Study of field desorption and adatom diffusion by means of direct field desorption ion imaging
Author :
Bernatskii, D.P. ; Pavlov, V.G.
Author_Institution :
A.F. Ioffe Physicotech. Inst., Acad. of Sci., St. Petersburg, Russia
fYear :
1996
fDate :
7-12 Jul 1996
Firstpage :
47
Lastpage :
50
Abstract :
Field desorption and surface diffusion of alkali and alkaline-earth metal (Na, Cs, Ba) atoms adsorbed on tungsten and iridium substrates were studied by methods of field emission microscopy. For all adatom-substrate systems studied a continuous imaging of surface in field desorption microscopy was achieved. The dependences of desorption field strength versus adsorbate concentration correlate with changes of work function of surface
Keywords :
adsorbed layers; desorption; field emission ion microscopy; field evaporation; ion emission; iridium; surface diffusion; tungsten; work function; Ba; Cs; Ir; Na; W; alkali adatom; alkaline-earth metal adatom; field desorption ion imaging; field emission microscopy; iridium substrate; surface diffusion; tungsten substrate; work function; Detectors; Earth; Electron emission; Electron microscopy; Grain boundaries; Microelectronics; Optical imaging; Temperature distribution; Tungsten; Visualization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
Conference_Location :
St. Petersburg
Print_ISBN :
0-7803-3594-5
Type :
conf
DOI :
10.1109/IVMC.1996.601771
Filename :
601771
Link To Document :
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