• DocumentCode
    3287409
  • Title

    Evaluation of microelectromechanical devices for DC and RF voltage measurements

  • Author

    Dittmer, Jan ; Judaschke, Rolf ; Büttgenbach, Stephanus

  • Author_Institution
    High-Freq. Meas. Group, Phys.-Tech. Bundesanstalt (PTB), Braunschweig, Germany
  • fYear
    2009
  • fDate
    25-28 Oct. 2009
  • Firstpage
    1056
  • Lastpage
    1060
  • Abstract
    Novel sensors for electrical DC and RF voltage measurements employing the principle of electrostatic force are presented. Microelectromechanical devices have been developed, fabricated and optimized, which are based on multiple capacitances with a common movable electrode. By applying a voltage to one capacitance, a force is generated which is translated into mechanical motion, eventually balanced by the mechanical spring counterforce of the suspension. Operating the device at frequencies above mechanical resonance allows the RMS value of the signal to be measured, supplementing conventional methods. For DC and RF voltage excitation, the resolution has been enhanced to be better than 0.1%. The usable frequency range has been extended beyond 10 Megahertz at RMS voltage levels of less than six volts. Furthermore, a model applied for dimensioning the sensors is presented focusing on high-frequency metrology aspects. By evaluating the frequency dependence of the design parameters, predictions of the measurement range and resolution of the final structures can be made.
  • Keywords
    mean square error methods; microsensors; voltage measurement; DC voltage measurements; RF voltage measurements; RMS voltage; electrostatic force; mechanical spring counterforce; microelectromechanical devices; multiple capacitances; root mean square voltage conversion; Capacitance; Electrodes; Electrostatics; Force measurement; Force sensors; Frequency measurement; Mechanical sensors; Microelectromechanical devices; Radio frequency; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Sensors, 2009 IEEE
  • Conference_Location
    Christchurch
  • ISSN
    1930-0395
  • Print_ISBN
    978-1-4244-4548-6
  • Electronic_ISBN
    1930-0395
  • Type

    conf

  • DOI
    10.1109/ICSENS.2009.5398592
  • Filename
    5398592