DocumentCode
3288223
Title
Plasma Chemical Etching of Silicon
Author
Bogomolov, B.K.
fYear
2006
fDate
26-28 Sept. 2006
Firstpage
265
Lastpage
266
Keywords
Biological tissues; Chemicals; Electrodes; Etching; Plasma applications; Plasma chemistry; Plasma devices; Plasma materials processing; Plasma properties; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Instrument Engineering, 2006. APEIE '06. 8th International Conference on Actual Problems of
Conference_Location
Novosibirsk, Russia
Print_ISBN
5-7782-0662-3
Type
conf
DOI
10.1109/APEIE.2006.4292454
Filename
4292454
Link To Document