• DocumentCode
    3288879
  • Title

    Vandium dioxide active plasmonics

  • Author

    Ooi, Kelvin J. A. ; Ping Bai ; Hong Son Chu ; Lay Kee Ang

  • Author_Institution
    Plasmonics & Nanointegration Group, A*STAR Inst. of High Performance Comput., Singapore, Singapore
  • fYear
    2012
  • fDate
    13-16 Dec. 2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The insulator-metal transition (IMT) property of vanadium dioxide provides a large, abrupt change in refractive index, making it a good candidate active material for optical modulators. We show, in this paper, that plasmonic modulators can leverage the high modulation contrast of vanadium dioxide, while at the same time solve the problems of high insertion loss and high phase-transition electric-field threshold faced by vanadium dioxide photonic modulators. Our simulation results show that vanadium dioxide plasmonic slot and hybrid-slot waveguide modulators can achieve extinction ratios in excess of 10dB/μm with insertion losses as low as 2dB/μm. We also show that vanadium dioxide can be used to build plasmonic ring modulators. These high performance modulators are foundations to realizing plasmonic nanocircuits for next-generation chip technology.
  • Keywords
    metal-insulator transition; optical losses; optical modulation; optical waveguides; plasmonics; refractive index; vanadium compounds; VO2; hybrid-slot waveguide modulators; insertion loss; insulator-metal transition property; modulation contrast; next-generation chip technology; optical modulators; phase-transition electric-field threshold; plasmonic modulators; plasmonic nanocircuits; plasmonic ring modulators; refractive index; vanadium dioxide active plasmonics; vanadium dioxide photonic modulators; vanadium dioxide plasmonic slot; Insertion loss; Materials; Optical waveguides; Phase modulation; Photonics; Plasmons; active plasmonics; plasmonic modulator; vanadium dioxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics Global Conference (PGC), 2012
  • Conference_Location
    Singapore
  • Print_ISBN
    978-1-4673-2513-4
  • Type

    conf

  • DOI
    10.1109/PGC.2012.6457923
  • Filename
    6457923