Stability of field electron emission of W, Mo and Re vacuum deposits depending on substrate temperature

Author

Chubun, N.N. ; Golubev, O.L. ; Djubua, B.Ch. ; Shrednik, V.N.

Author_Institution

SRPS Istok, Fryazino, Russia

fYear

1996

fDate

7-12 Jul 1996

Firstpage

129

Lastpage

132

Abstract

Field electron emission of Mo on Mo, W on W and Re on Re vacuum deposits has been investigated. Many monatomic layers of Mo, W and Re have been deposited on the tip of the same material. A wide range of substrate temperature has been used: from room temperature to 660, 800 and 660 K for Mo, W and Re respectively. Three surface forms of deposit have been obtained in these temperature ranges: (1) low-temperature disordered condensate; (2) so called replication; and (3) ordered crystal outgrowths (so called “collars”). Then the stability of field electron current was examined. As a result it was shown that the stage of replication was characterised as the most stable form. The most unstable situation was typical for the low-temperature disordered condensate

Keywords

electron field emission; metallic thin films; molybdenum; rhenium; stability; tungsten; vacuum deposited coatings; vacuum microelectronics; 273 to 800 K; Mo; Mo vacuum deposit; Mo-Mo; Re; Re vacuum deposit; Re-Re; W; W vacuum deposit; W-W; collars; field electron current; field electron emission stability; low-temperature disordered condensate; ordered crystal outgrowths; replication; substrate temperature; Annealing; Cathodes; Crystalline materials; Electron emission; Electron microscopy; Microelectronics; Stability; Temperature dependence; Temperature distribution; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International

Conference_Location

St. Petersburg

Print_ISBN

0-7803-3594-5

Type

conf

DOI

10.1109/IVMC.1996.601789

Filename

601789