DocumentCode :
3290697
Title :
Narrow linewidth 894 nm distributed feedback lasers with laterally-coupled ridge-waveguide surface gratings fabricated using nanoimprint lithography
Author :
Dumitrescu, M. ; Telkkala, J. ; Karinen, J. ; Laakso, A. ; Viheriala, J. ; Leinonen, T. ; Lyytikäinen, J. ; Toikkanen, L. ; Pessa, M.
Author_Institution :
Optoelectron. Res. Centre, Tampere Univ. of Technol., Tampere, Finland
Volume :
01
fYear :
2010
fDate :
11-13 Oct. 2010
Firstpage :
131
Lastpage :
141
Abstract :
The paper presents the modelling and design particularities of laterally-coupled distributed feedback lasers (LC-DFB), the fabrication process, involving a highly productive and cost-effective UV-nanoimprint lithography technique, and the characteristics obtained up to now for the LC-DFB lasers fabricated for pumping Cesium atomic clocks. 550 μm long LC-DFB lasers, emitting at 894 μm, had 10 mA threshold currents and maintained over 40dB side-mode-suppression-ratio between 10 and 100°C. The measured self-homodyne spectrum indicated a linewidth below 1.3 MHz for AR/HR-coated 1000 μm long LC-DFB lasers and the simulations indicate that the use of phase-shift sections could reduce the linewidth below 250 kHz.
Keywords :
diffraction gratings; distributed feedback lasers; nanolithography; optical couplers; optical fabrication; optical phase shifters; ridge waveguides; semiconductor lasers; ultraviolet lithography; waveguide lasers; UV-nanoimprint lithography; laterally-coupled ridge-waveguide surface gratings; narrow linewidth distributed feedback lasers; phase-shift sections; pumping Cesium atomic clocks; selfhomodyne spectrum; side-mode-suppression-ratio; temperature 10 degC to 100 degC; threshold currents; wavelength 894 nm; Couplings; Gratings; Optical coupling; Optical refraction; Optical variables control; Refractive index; Surface emitting lasers; distributed feedback lasers; nanoimprint lithography; surface gratings;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference (CAS), 2010 International
Conference_Location :
Sinaia
ISSN :
1545-827X
Print_ISBN :
978-1-4244-5783-0
Type :
conf
DOI :
10.1109/SMICND.2010.5649034
Filename :
5649034
Link To Document :
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