Title :
A CMOS Dissolved Wafer Process For Integrated P++ Microelectromechanical Systems
Author :
Gianchandani, Yogesh B. ; Ma, Karl J. ; Najafi, Khalil
Author_Institution :
University of Michigan
Keywords :
Boron; CMOS process; CMOS technology; Etching; Fabrication; Glass; Integrated circuit technology; Microelectromechanical systems; Microstructure; Silicon;
Conference_Titel :
Solid-State Sensors and Actuators, 1995 and Eurosensors IX.. Transducers '95. The 8th International Conference on
Print_ISBN :
91-630-3473-5
DOI :
10.1109/SENSOR.1995.717093
