DocumentCode :
329141
Title :
pH-controlled TMAH Etchants For Silicon Micromachining
Author :
Tabata, Osamu
Author_Institution :
Toyota Central Research and Development Laboratories, Inc.
Volume :
1
fYear :
1995
fDate :
25-29 Jun 1995
Firstpage :
83
Lastpage :
86
Keywords :
Aluminum; Anisotropic magnetoresistance; Etching; Mechanical variables measurement; Micromachining; Research and development; Rough surfaces; Silicon; Surface roughness; Time measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors and Actuators, 1995 and Eurosensors IX.. Transducers '95. The 8th International Conference on
Print_ISBN :
91-630-3473-5
Type :
conf
DOI :
10.1109/SENSOR.1995.717094
Filename :
717094
Link To Document :
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