Title :
Monitoring plasma over-etching of Wafer-bonded Microstructures
Author :
Gupta, Raj K. ; Hsu, Charles H. ; Schmidt, M.A. ; Senturia, S.D.
Author_Institution :
Massachusetts Institute of Technology
Keywords :
Electrostatics; Material properties; Microstructure; Monitoring; Nuclear and plasma sciences; Plasma measurements; Residual stresses; Silicon; Testing; Voltage;
Conference_Titel :
Solid-State Sensors and Actuators, 1995 and Eurosensors IX.. Transducers '95. The 8th International Conference on
Print_ISBN :
91-630-3473-5
DOI :
10.1109/SENSOR.1995.717168
