Title :
Critical fabrication processes for programmable HACT DPTFs
Author :
Miller, R.L. ; Bailey, D.S. ; Blais, P. ; Henry, G. ; Sopira, M. ; Eldridge, G. ; Messham, R.
Author_Institution :
Westinghouse Electronic Systems Group, Baltimore, MD, USA
Abstract :
The type of acoustic charge transport (ACT) device which has generated the most widespread interest among electronics system designers is the digitally programmable transversal filter (DPTF). A heterojunction ACT (HACT) DPTF, having 128 taps with 5-b tap resolution and on-chip buffer amplifiers for input and output, is described. The device is being fabricated by a combination of epitaxial and ion-implantation processes, and it employs three metal layers. In addition to providing very high resolution for fine-line lithography and large depth of field for the nonplanar circuits in a HACT DPTF, E-beam lithography allows easy adjustment of critical circuit elements to adjust for parasitics, without the need to generate new mask layers. A discussion of the expected performance of this device is presented
Keywords :
digital filters; electron beam lithography; surface acoustic wave filters; acoustic charge transport; digitally programmable transversal filter; electronics system designers; epitaxial; fine-line lithography; heterojunction ACT; ion-implantation processes; large depth of field; nonplanar circuits; on-chip buffer amplifiers; programmable HACT DPTFs; three metal layers; Acoustic devices; FETs; Fabrication; Flexible printed circuits; Gallium arsenide; Heterojunctions; Impedance; Lithography; MMICs; Transversal filters;
Conference_Titel :
Ultrasonics Symposium, 1991. Proceedings., IEEE 1991
Conference_Location :
Orlando, FL
DOI :
10.1109/ULTSYM.1991.234115