DocumentCode :
3292004
Title :
Accurate effective mobility extraction in SOI MOS transistors
Author :
Thomas, S.M. ; Whall, T.E. ; Parker, E.H.C. ; Leadley, D.R. ; Lander, R.J.P. ; Vellianitis, G. ; Watling, J.R.
Author_Institution :
Dept. of Phys., Univ. of Warwick, Coventry
fYear :
2009
fDate :
18-20 March 2009
Firstpage :
31
Lastpage :
34
Abstract :
Accurate effective mobility calculations of MOSFETs are necessary when assessing the importance of various performance limiting carrier scattering mechanisms. A novel and simple to use technique to correct for the absence of drain bias during the split CV measurement is presented. Its effectiveness is demonstrated by application to a quasi planar SOI MOSFET at 300 K and 4 K. The lateral field and diffusion corrections, which are commonly neglected, are considered and it is shown that they cancel.
Keywords :
MOSFET; carrier mobility; semiconductor device measurement; silicon-on-insulator; MOSFET; SOI MOS transistor; Si-SiO2; carrier scattering mechanism; diffusion correction; drain bias; effective mobility extraction; lateral field; split CV measurement; temperature 300 K; temperature 4 K; Capacitance measurement; Charge measurement; Current measurement; FinFETs; High-K gate dielectrics; Lead compounds; MOSFETs; Physics; Scattering; Transmission line measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration of Silicon, 2009. ULIS 2009. 10th International Conference on
Conference_Location :
Aachen
Print_ISBN :
978-1-4244-3704-7
Type :
conf
DOI :
10.1109/ULIS.2009.4897532
Filename :
4897532
Link To Document :
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