Fabrication and characterization of DLC-coated field emitter array

Author

Ko, Chang Gi ; Ju, Byeong Kwon ; Lee, Yun Hi ; Park, Jung Ho ; Oh, Myung Hwan

Author_Institution

Div. of Electron. & Inf. Technol., Korea Inst. of Sci. & Technol., Seoul, South Korea

fYear

1996

fDate

7-12 Jul 1996

Firstpage

226

Lastpage

230

Abstract

We fabricated diamond-like-carbon (DLC) coated knife edge field emitter array (KEFEA) on the (110) oriented silicon wafer. The fabricated KEFEA have above six hundreds times of aspect ratio. Then we coated the KEFEA with 300 Å thick DLC film by PECVD method. And we measured the emission current from the KEFEA under vacuum pressure of around 2×10^-7 torr. The threshold voltage of the DLC-coated KEFEA lowered about 200 V compared with the bare Si KEFEA. By coating the DLC film, its emission stability was dramatically improved. A simulation on the emitter has been performed by using MAXWELL software

Keywords

CVD coatings; carbon; electron field emission; vacuum microelectronics; (110) oriented silicon wafer; DLC film; KEFEA; MAXWELL software; PECVD coating; Si-C; aspect ratio; diamond-like carbon; fabrication; knife edge field emitter array; simulation; threshold voltage; Crystallization; Etching; Fabrication; Field emitter arrays; Optical films; Semiconductor films; Silicon; Software performance; Thermal conductivity; Threshold voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International

Conference_Location

St. Petersburg

Print_ISBN

0-7803-3594-5

Type

conf

DOI

10.1109/IVMC.1996.601813

Filename

601813