DocumentCode
3292817
Title
New type of MZOS FET convolver
Author
Böttcher, Ronald ; Buff, Werner
Author_Institution
Ilmenau Inst. of Technol., Germany
fYear
1991
fDate
8-11 Dec 1991
Firstpage
259
Abstract
Two novel MOSFET convolver structures based on the nonlinear dependence of FET drain current on gate bias in the saturation region, are described. It is shown that a modification of conventional MOSFET convolvers and a new mixing mechanism lead to better performance of known convolver structures. Although the experimental results show good agreement with theoretical estimates, there is a wide field of improvements of the device parameters. With a better controlled deposition process of the ZnO film and a smoother interface for the ZnO by means of a planarization process, the piezoelectric performance and the conversion efficiency of the convolvers will be better and higher. The reduction of the channel length of the MOS transistors leads to a higher transconductance for the FETs, and the operating frequency of the devices can also be increased
Keywords
insulated gate field effect transistors; signal processing equipment; surface acoustic wave devices; zinc compounds; FET drain current; MZOS FET convolver; ZnO; channel length; conversion efficiency; deposition process; device parameters; gate bias; interface roughness; mixing mechanism; novel MOSFET convolver structures; operating frequency; piezoelectric performance; planarization process; saturation region; transconductance; Convolvers; Estimation theory; FETs; Frequency; MOSFET circuits; Piezoelectric films; Planarization; Process control; Transconductance; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium, 1991. Proceedings., IEEE 1991
Conference_Location
Orlando, FL
Type
conf
DOI
10.1109/ULTSYM.1991.234166
Filename
234166
Link To Document