Relationship between field emission characteristics and hydrogen content in DLC deposited by layer-by-layer technique using PECVD

Author

Park, Kyu Chang ; Moon, Jong Hyun ; Chung, Suk Jae ; Oh, Myung Hwan ; Milne, W.I. ; Jang, Jin

Author_Institution

Dept. of Phys., Kyung Hee Univ., Seoul, South Korea

fYear

1996

fDate

7-12 Jul 1996

Firstpage

268

Lastpage

272

Abstract

We deposited diamond-like-carbon (DLC) films of various hydrogen content by plasma enhanced chemical vapor deposition. The hydrogen content in the DLC film was controlled by a novel technique called a layer-by-layer deposition, in which the deposition of a thin layer of DLC and a CF₄ plasma exposure on its surface were carried out alternatively. The DLC films with different hydrogen content could be obtained by varying the CF₄ plasma exposure time. The emission current increases and turn-on field decreases with decreasing hydrogen content in the DLC film

Keywords

carbon; electron field emission; hydrogen; plasma CVD; plasma CVD coatings; thin films; vacuum microelectronics; C:H; CF₄ plasma exposure time; DLC films; H content; PECVD; chemical vapor deposition; diamond-like carbon films; emission current; field emission characteristics; layer-by-layer deposition; plasma enhanced CVD; turn-on field; Area measurement; Chemical vapor deposition; Electromagnetic wave absorption; Electron emission; Helium; Hydrogen; Plasma chemistry; Substrates; Vacuum arcs; Vacuum technology;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International

Conference_Location

St. Petersburg

Print_ISBN

0-7803-3594-5

Type

conf

DOI

10.1109/IVMC.1996.601822

Filename

601822