Title :
Field emission characteristics of amorphous carbon and diamond emitters
Author :
Shim, J.Y. ; Chi, E.J. ; Baik, H.K.
Author_Institution :
Dept. of Metall. Eng., Yonsei Univ., Seoul, South Korea
Abstract :
Amorphous carbon and diamond coated emitters have been used to examine field emission characteristics. Amorphous carbon is coated by a new process named helical resonator plasma enhanced chemical vapor deposition. An amorphous carbon emitter with broad disordered graphite peak and small wavenumber of graphite exhibits a better I-V characteristic than that with an intense disordered graphite peak and large wavenumber of graphite. Field emission from diamond coated emitters shows enhancement both in turn-on voltage and total emission current. Diamond coated emitters have a considerable amount of graphite which may allow continuous low field emission. We think that negative electron affinity and graphite inclusions seem to improve the field emission characteristics. However, further work is necessary to exactly clarify the mechanism for low field emission
Keywords :
amorphous state; carbon; diamond; electron affinity; electron field emission; inclusions; plasma CVD coatings; vacuum microelectronics; C; I-V characteristic; amorphous C emitters; chemical vapor deposition; coated emitters; continuous low field emission; diamond emitters; emission current; field emission characteristics; graphite inclusions; helical resonator PECVD; negative electron affinity; plasma enhanced CVD; turn-on voltage; Amorphous materials; Carbon dioxide; Chemicals; Diamond-like carbon; Electron emission; Plasma chemistry; Plasma properties; Semiconductor films; Substrates; Voltage;
Conference_Titel :
Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
Conference_Location :
St. Petersburg
Print_ISBN :
0-7803-3594-5
DOI :
10.1109/IVMC.1996.601827