• DocumentCode
    3292963
  • Title

    Effective-mass model of surface scattering in locally oxidized Si nanowires

  • Author

    Drouvelis, P. ; Fagas, G.

  • Author_Institution
    Inst. for Interdiscipl. Sci. Comput., Univ. of Heidelberg, Heidelberg
  • fYear
    2009
  • fDate
    18-20 March 2009
  • Firstpage
    253
  • Lastpage
    256
  • Abstract
    We present a simple model to describe the lowest-subbands surface scattering in locally oxidized silicon nanowires grown in the [110] direction. To this end, we employ an atomistically scaled effective mass model projected from a three-dimensional effective mass equation and apply a quantum transport formalism to calculate the conductance for typical potential profiles. Comparison of our results with hole-transport calculations using atomistic models in conjunction with density functional theory (DFT) points to an intra-subband scattering mechanism from a potential well.
  • Keywords
    density functional theory; effective mass; elemental semiconductors; nanowires; silicon; 3D effective mass equation; Si; atomistic models; density functional theory; effective mass model; hole transport calculations; intra-subband scattering; locally oxidized Si nanowires; quantum transport; surface scattering; Atomic measurements; Effective mass; Equations; Nanowires; Oxidation; Particle scattering; Rough surfaces; Silicon; Surface roughness; Wire; Intraband scattering; oxidation; silicon nanowires;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultimate Integration of Silicon, 2009. ULIS 2009. 10th International Conference on
  • Conference_Location
    Aachen
  • Print_ISBN
    978-1-4244-3704-7
  • Type

    conf

  • DOI
    10.1109/ULIS.2009.4897584
  • Filename
    4897584