Title :
In Situ Particle Monitors: The Next Level of Yield Control for Critical Processes
Author :
Burghard, Ray ; Moriya, Tsuyoshi ; Matsuzaki, Kazuyoshi ; Nagaike, Hiroshi ; Nakayama, Hiroyuki
Author_Institution :
INFICON Inc., Syracuse
Abstract :
In situ particle monitors (ISPM) have been used in the semiconductor industry for many years to monitor chamber condition before and after preventative maintenance. New improvements in particle detection technology combined with novel methods to remove particles from the chamber are proving that ISPM technology is a key component in the fight to improve product yields.
Keywords :
condition monitoring; design for manufacture; integrated circuit manufacture; preventive maintenance; chamber condition monitoring; critical processes; in situ particle monitors; particle detection technology; preventative maintenance; semiconductor industry; yield control; Counting circuits; Electronics industry; Etching; Particle measurements; Particle production; Plasma measurements; Pollution measurement; Process control; Semiconductor device measurement; Sensor systems;
Conference_Titel :
Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
978-4-9904138-0-4
DOI :
10.1109/ISSM.2006.4493008
