Title :
Selective And Sensitive Detection Of Volatile Organic Compounds In Plasma Film Technology With Amino Acids And Fluoropolymers
Author :
Sugimoto, Iwao ; Nakamura, Masayuki ; Kuwano, Hiroki
Author_Institution :
NTT Interdisciplinary Research Laboratories
Keywords :
Amino acids; Chemical technology; Gas detectors; Plasma applications; Plasma chemistry; Plasma devices; Plasma properties; Solvents; Sputtering; Volatile organic compounds;
Conference_Titel :
Solid-State Sensors and Actuators, 1995 and Eurosensors IX.. Transducers '95. The 8th International Conference on
Print_ISBN :
91-630-3473-5
DOI :
10.1109/SENSOR.1995.717365
