Title :
Comparison of Rayleigh and Sezawa wave modes in ZnO-SiO2-Si structures
Author :
Weber, A.H. ; Weiss, G. ; Hunklinger, S.
Author_Institution :
Inst. of Appl. Phys., Heidelberg Univ., Germany
Abstract :
ZnO-SiO2-Si surface acoustic wave (SAW) devices with polycrystalline ZnO films of high quality at a thickness h between 0.3 and 15 μm were fabricated using the RF-magnetron bias sputtering technique. X-ray diffraction, rocking curves, and SEM microscopy were used to characterize the ZnO layers. The authors studied the propagation loss and the coupling coefficient of three different types of devices: Rayleigh wave devices with ZnO layers h/λ≃0.4 and h/λ≃0.04, and Sezawa wave devices. Measurements were performed in the frequency range between 80 and 600 MHz. It was observed that Rayleigh wave devices with a thin ZnO layer have a much lower frequency dependence of the propagation loss than the other two types of SAW devices. At 550 MHz, devices with thin ZnO layers exhibit a propagation loss of only 7 dB/cm, compared to 24 dB/cm for Rayleigh wave devices with a thick ZnO layer, and 14 dB/cm for the Sezawa wave devices. Phase velocity and coupling coefficient as a function of film thickness were examined and are compared with theoretical values
Keywords :
II-VI semiconductors; X-ray diffraction examination of materials; elemental semiconductors; scanning electron microscope examination of materials; silicon; silicon compounds; surface acoustic wave devices; zinc compounds; 80 to 600 MHz; RF sputtering; Rayleigh wave devices; SAW; SEM microscopy; Sezawa wave modes; X-ray diffraction; ZnO-SiO2-Si; propagation loss; semiconductor; Acoustic diffraction; Acoustic waves; Frequency measurement; Propagation losses; Scanning electron microscopy; Sputtering; Surface acoustic wave devices; Surface acoustic waves; X-ray diffraction; Zinc oxide;
Conference_Titel :
Ultrasonics Symposium, 1991. Proceedings., IEEE 1991
Conference_Location :
Orlando, FL
DOI :
10.1109/ULTSYM.1991.234187