Title :
Silicon Rich Oxide with controlled mean size of silicon nanocrystals by deposition in multilayers
Author :
Quiroga, E. ; Bensch, W. ; Aceves, M. ; Yu, Z. ; Savy, J.P. ; Haeckel, M. ; Lechner, A.
Author_Institution :
Inst. for Inorg. Chem., Univ. of Kiel, Kiel
Abstract :
The size of Si nanocrystals in silicon rich oxide has been varied by depositing this material in multilayer arrays. They are possible candidates for one dimensional quantum devices. A study based on TEM, Raman and XRD measurements is presented.
Keywords :
Raman spectra; X-ray diffraction; chemical vapour deposition; elemental semiconductors; multilayers; nanofabrication; nanoparticles; particle size; silicon; transmission electron microscopy; Raman spectra; Si; TEM; XRD; low pressure chemical vapor deposition; multilayer arrays; one dimensional quantum devices; silicon nanocrystals; silicon particle size; silicon rich oxide; Crystallization; Extraterrestrial measurements; Gases; Nanocrystals; Nonhomogeneous media; Performance evaluation; Phonons; Silicon; Size control; X-ray scattering; Raman for size determination; SRO; Si nanocrystals; Silicon Rich Oxide; multilayer; size control;
Conference_Titel :
Ultimate Integration of Silicon, 2009. ULIS 2009. 10th International Conference on
Conference_Location :
Aachen
Print_ISBN :
978-1-4244-3704-7
DOI :
10.1109/ULIS.2009.4897607
