Title :
Development on the Highly Precise Detection System for the Abnormal Discharge at the Plasma Etching Equipment
Author :
Ise, H. ; Shinohara, K. ; Hanawa, T.
Author_Institution :
Renesas Technol. Corp., Hitachinaka
Abstract :
We´ve established a novel technology that can detect abnormal discharge of dry etching process. This technology consists of a system monitoring the signal of the plasma impedance as well as the reflection power at every 1 msec. (a millisecond) and well-optimized diagnosis algorithm. Based on the algorithm, the system can detect the abnormal discharge even at unstable plasma ignition step and send alarm signal to the dry etcher for stopping the following wafer processing. The detection system based on this technology enables us to minimize the number of damaged wafers due to the abnormal discharging.
Keywords :
discharges (electric); plasma diagnostics; plasma heating; semiconductor device manufacture; sputter etching; abnormal discharge detection; alarm signal; high-precise detection system; plasma dry etching equipment; plasma ignition step; plasma impedance; wafer processing; Acoustic signal detection; Dry etching; Electrodes; Ignition; Optical reflection; Plasma applications; Plasma diagnostics; Plasma materials processing; Radio frequency; Signal processing;
Conference_Titel :
Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
978-4-9904138-0-4
DOI :
10.1109/ISSM.2006.4493034
