Development of monitoring technology of ion implanter for particle detection

This paper describes the development of monitoring technology in an ion implanter to determine a root cause of particle generation. It is demonstrated that an in-situ particle counter is not so useful in the region of a few numbers of particles. By analyzing equipment parameter data like an ion beam centroid, an electrode position and a magnetic flux density at a mass analyzer using equipment monitoring, it is cleared that ion beam trajectories between two ion implanters are different. Finally, by adjusting the ion beam trajectory in the ion implanter, it is confirmed that the number of particles can be reduced and the maintenance cycle becomes about 3.5 times longer before adjusting the ion beam trajectory.