DocumentCode :
3293469
Title :
Fab-wide equipment monitoring and FDC system
Author :
Imai, Shin-ichi ; Sato, Naoaki ; Kitabata, Masaki ; Yasuda, Satoshi
Author_Institution :
Matsushita Electr. Ind. Co. Ltd, Uozu
fYear :
2006
fDate :
25-27 Sept. 2006
Firstpage :
114
Lastpage :
117
Abstract :
This paper describes development and actual utilization of a fab-wide equipment monitoring system using a secondary port separating a primary port shared by an MES and a fab-wide FDC (fault detection and classification) system. In data collection of equipment parameter, a new concept of important parameter is introduced. As an example of the fab-wide FDC, an FDC of a slurry flow rate fault in CMP equipment from the start-up is demonstrated. Moreover, in order to quantitatively estimate equipment quality, Cpk for each parameter of equipment in fab-wide is calculated and it is confirmed that equipment quality is increasing from starting up equipment.
Keywords :
fault diagnosis; monitoring; semiconductor device manufacture; data collection; fab-wide equipment monitoring; fault detection-classification; slurry flow rate fault; Chemical technology; Condition monitoring; Electrical equipment industry; Fault detection; Manufacturing industries; Pulp manufacturing; Semiconductor device manufacture; Semiconductor devices; Toy industry; Toy manufacturing industry;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on
Conference_Location :
Tokyo
ISSN :
1523-553X
Print_ISBN :
978-4-9904138-0-4
Type :
conf
DOI :
10.1109/ISSM.2006.4493037
Filename :
4493037
Link To Document :
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