Title :
Improvement of photolithography process by 2nd Generation Data Mining
Author :
Tsuda, Hidetaka ; Shirai, Hidehiro
Author_Institution :
Fujitsu LSI Technol. Ltd., Kawasaki
Abstract :
Advanced Process Control (APC) system has been developed and already been introduced about CD and overlay controls in photolithography process, and productivity and device performance have been improved. However, current APC is based on the inspection data where process deviation combined with machine fluctuation, and had the limit in the effect. The purpose of this paper is to show that we have developed 2nd Generation Data Mining system in cooperation with APC and have proven the effect of stabilizing machine fluctuation.
Keywords :
data mining; photolithography; process control; productivity; semiconductor device manufacture; advanced process control; data mining; device performance; machine fluctuation; photolithography; process deviation; productivity; semiconductor manufacturing; Data mining; Fluctuations; Inspection; Large scale integration; Lithography; Process control; Productivity; Regression tree analysis; Research and development; Semiconductor device manufacture;
Conference_Titel :
Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
978-4-9904138-0-4
DOI :
10.1109/ISSM.2006.4493039
