DocumentCode :
3293583
Title :
About a change of the threshold voltage at nanostructure formation in the scanning tunneling microscope
Author :
Vladimirov, G.G. ; Drozdov, A.V. ; Rezanov, A.N.
Author_Institution :
Dept. of Phys., St. Petersburg State Univ., Russia
fYear :
1996
fDate :
7-12 Jul 1996
Firstpage :
453
Lastpage :
457
Abstract :
It is shown that the process of nanostructure formation is determined in many respects by parameters of the electrical circuit used in the STM . The hills formation probability from the applying voltage pulse Upulse for various quantities of an impedance of the preliminary amplifier (PA) and for various quantities of additional resistor Rx is investigated. A change of the impedance PA is carried out by the additional capacity Cx. This capacitor shunts an entering impedance PA. Connection Cx results in a change of a threshold voltage Uth of nanostructure formation. The threshold voltage decreases with a reduction of an entering impedance (increase Cx). Such behaviour of Uth argues for the mechanism of thermal expansion tip
Keywords :
nanotechnology; scanning tunnelling microscopy; surface treatment; thermal expansion; electrical circuit; entering impedance; hills formation probability; nanostructure formation; preliminary amplifier; scanning tunneling microscope; thermal expansion tip; threshold voltage; Circuits; Gold; Impedance; Microscopy; Physics; Pulse amplifiers; Surface morphology; Thermal expansion; Threshold voltage; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
Conference_Location :
St. Petersburg
Print_ISBN :
0-7803-3594-5
Type :
conf
DOI :
10.1109/IVMC.1996.601863
Filename :
601863
Link To Document :
بازگشت