Analysis on contact failure of instrument and control switch in nuclear power plant

Author

Jie, Shi ; Jianlin, Yao ; Yongnian, Wang ; Haining, Shi ; Fengsheng, Tu

Author_Institution

Suzhou Nucl. Power Instn., Suzhou, China

fYear

2009

fDate

6-10 July 2009

Firstpage

485

Lastpage

488

Abstract

For understanding the law that the trend of contact resistance follows the changed current, an equipment which was made up of an intelligent multi-function data acquisition, cooperated with PC programs, for measuring contact resistance was developed. The scanning electron microscopy(SEM) and Energy Dispersive Analysis System of X-ray were used to analyse the microstructure of contact. By observing the microcosmic appearance and analysing the component of contact, the failure reasons was confirmed.

Keywords

X-ray microscopy; failure analysis; nuclear power stations; scanning electron microscopy; X-ray; contact failure analysis; contact resistance; control switch; energy dispersive analysis system; intelligent multi-function data acquisition; microcosmic appearance; nuclear power plant; scanning electron microscopy; Contact resistance; Current measurement; Data acquisition; Dispersion; Electrical resistance measurement; Failure analysis; Instruments; Power generation; Scanning electron microscopy; Switches;

fLanguage

English

Publisher

ieee

Conference_Titel

Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the

Conference_Location

Suzhou, Jiangsu

ISSN

1946-1542

Print_ISBN

978-1-4244-3911-9

Electronic_ISBN

1946-1542

Type

conf

DOI

10.1109/IPFA.2009.5232601

Filename

5232601